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Critical Dimension Half Tone
Simultaneous measurement of halftone and CD in the Array/TFT process to optimize process conditions such as coating amount, exposure dose, and etching amount
Capable of 2D and 3D measurement
Stabilize process and improve yield through real-time monitoring
High technology
- Capability to measure CD, thickness, and height simultaneously in a single acquisition
- Nanoscale resolution and high-speed measurement
Application
- Halfton thickness, Overlay, Hole, PR, ITO, Slit line width measurement, etc.