R&D

Next-Generation Process Equipment

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Next-Generation Process Equipment
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Source

  • Point Source: Develop point-like evaporation sources for uniform deposition and rate control
  • Linear Source: Develop linear evaporation source for uniform deposition and rate control on large area substrates
  • Source for high-resolution Micro OLED: Special evaporation source for high-resolution deposition with minimized shadowing technology on wafer substrate