业务领域

利用白光干涉原理进行三维表面形状测量-微小图案的高度差和CD测量

模组复合测量设备

为优化Array/TFT工艺条件如涂布量、曝光量、蚀刻量等，同时测量灰阶图案和关键尺寸

Research and analysis equipment utilizing the principle of non-contact 3D surface measurement

Equipment capable of producing high-quality OLEDs using a vacuum-based organic and inorganic material deposition system